RF Plasma CVD of C-S Compound under Hydrogen Dilution
نویسندگان
چکیده
منابع مشابه
COMPARISON OF VHF, RF AND DC PLASMA EXCITATION FOR a-Si:H DEPOSITION WITH HYDROGEN DILUTION
A comparative study of DC, RF and VHF excitation for the plasma enhanced chemical vapor deposition (PECVD) of intrinsic layers of a-Si:H is presented, with special emphasis on the effects of hydrogen dilution. Growth rates at comparable plasma power, for substrate temperatures between 100°C and 300°C and for various H2 dilution ratios are presented, along with optical bandgap, H content, and el...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2000
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.13.47